The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 05, 1988

Filed:

Nov. 26, 1986
Applicant:
Inventors:

Bantval J Baliga, Schenectady, NY (US);

Tat-Sing P Chow, Schenectady, NY (US);

Assignee:

General Electric Company, Schenectady, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
437 29 ; 437148 ;
Abstract

An eight mask process for forming a lateral insulated gate semiconductor device is disclosed. The gate structure can be used as a mask to align the third and fifth regions of the device and a third protective layer aligns the fourth and sixth regions of the device.


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