The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 1987
Filed:
Jan. 23, 1986
Nippon Kogaku K. K., Tokyo, JP;
Abstract
An arrangement in an apparatus for handling a substrate such as a photomask or a reticle used in a process of manufacturing a semiconductor device comprises a container unit for containing therein the substrate in a substantially horizontal posture, an inspection unit having means for inspecting a surface of the substrate, the inspecting means including a radiation source for supplying a directional beam, and a device for detecting the scattering of the directional beam, a holding member for supporting the substrate substantially horizontally, a device for moving the holding member between the container unit and the inspection unit and conveying the substrate from the container unit to the inspection unit by the use of the holding member, and a scanning device for moving the holding member in a horizontal direction relative to the inspecting means and moving the substrate relative to the directional beam while subjecting the surface of the substrate to the directional beam.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile