The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 1987
Filed:
May. 05, 1986
Applicant:
Inventors:
Ingolf Lampert, Burghausen, DE;
Herbert Jacob, Burghausen, DE;
Assignee:
Wacker-Chemitronic Gesellschaft fur Elektronik-Grundstoffe mbH, Burghausen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B / ;
U.S. Cl.
CPC ...
204 345 ; 204 561 ; 5128 / ; 51323 ; 51326 ;
Abstract
A process for polishing silicon wafers includes the step of carrying out last polishing step in the polishing operation in such a way that a protective film of silicon dioxide is produced on the surface of the polished wafer. The film does not interfere with e.g., the subsequent oxidation processes. The protective film protects the wafer surface from the many effects arising in subsequent processes which may unfavorably influence the quality of the surface.