The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 1987
Filed:
Nov. 17, 1986
Abstract
A method for applying surface plasma-treating to works of resin material in a reaction chamber by irradiating the surfaces of the works with a microwave discharge plasma within the reaction chamber, comprising injection the plasma from a plurality of positions located adjacently to the inner wall of the reaction chamber, and injecting the plasma from each injecting position in a certain spreading angle along the direction of injection. An apparatus for plasma treatment, capable of plasma-treating works of resin material by irradiating the surfaces of the works with a microwave discharge plasma within a vacuum reaction chamber which is in the form of a circular cylinder of 1000 mm or more in diameter, the form of a square prism of 1000 mm or more in the length of a side of the analogous form, comprising a plurality of plasma introducing ports formed in the wall of the reaction chamber at optional positions thereon; and a glass pipe connected to each plasma introducing port for injecting the plasma into the reaction chamber in a certain spreading angle along the direction of injection.