The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 1987
Filed:
Apr. 22, 1986
Koichi Matsushita, Chiba, JP;
Junji Isohata, Tokyo, JP;
Hironori Yamamoto, Chigasaki, JP;
Makoto Miyazaki, Yokohama, JP;
Kunitaka Ozawa, Isehara, JP;
Hideki Yoshinari, Yokohama, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus for exposing a plate-like member to a pattern with radiation in a step-and-repeat manner thereby to transfer images of the pattern onto different regions on a surface of the plate-like member. The apparatus includes an X-Y stage for moving the plate-like member in X and Y directions, a .theta.-stage for moving the plate-like member in a .theta. (rotational) direction relative to the X-Y stage, and laser interferometers for measuring an amount of movement of the plate-like member, by the X-Y stage, in each of the X and Y directions by use of a mirror mounted on the .theta.-stage. Placement of the mirror on the .theta.-stage allows correction of yawing if it occurs during movement of the plate-like member by X-Y stage. Also, deviation of the plate-like member in the Y direction if it occurs during movement of the plate-like member by the X-Y stage in the X direction, is detected by the laser interferometers. This allows detection of a positional error of the mirror in the .theta. direction and allows correction of the .theta.-error by the .theta.-stage.