The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 1987
Filed:
Sep. 19, 1985
Applicant:
Inventor:
Sheng T Hsu, Lawrenceville, NJ (US);
Assignee:
RCA Corporation, Princeton, NJ (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
29578 ; 29571 ; 2957 / ; 29580 ; 148D / ; 156649 ; 156653 ; 357 56 ; 427 94 ;
Abstract
A method of exposing only the top surface of a narrow mesa is disclosed wherein a protective layer may be very precisely formed on a very narrow mesa for subsequent doping of areas adjacent the mesa without doping the mesa itself. A variation of the invention includes forming an opening directly over the narrow mesa so that a contact may be made at only the top surface of the mesa or the upper portion of the mesa may be doped independent of surfaces adjacent the mesa.