The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 1987
Filed:
Sep. 13, 1985
Siemens Aktiengesellschaft, Berlin and Munich, DE;
Abstract
A method for the manufacture of a pn junction having a high breakdown voltage at the boundary surface of a semiconductor body, utilizing a mask which has a relatively large opening for introducing a dopant therethrough into the semiconductor body, the mask having a marginal edge which extends laterally beyond the edge of the relatively large opening. In the marginal edge, the mask is provided with smaller, auxiliary openings, the openings being sized and spaced such that lesser amounts of dopant pass through the opening as the distance of the auxiliary openings from the edge of the relatively larger opening increases. Upon introducing the dopant into the semiconductor body through the mask, there is generated a doping profile which gradually approaches the boundary surface with increasing distance from the edge of the relatively large opening.