The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 1987
Filed:
Mar. 13, 1985
Applicant:
Inventors:
Henry S Marek, South Salem, NY (US);
Christian G Michel, Ossining, NY (US);
John A Baumann, Ossining, NY (US);
Mark A Kuck, Upper Montclair, NJ (US);
Assignee:
Stauffer Chemical Company, Westport, CT (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C01B / ; C01B / ; C01B / ;
U.S. Cl.
CPC ...
423322 ; 423299 ;
Abstract
MP.sub.15, where M is an alkali metal is used in a generator of P.sub.4 gas. KP.sub.15 is preferred. The generator is heated to produce the P.sub.4 gas. The generator may be used in various deposition processes such as chemical vapor deposition, vacuum evaporation, and molecular beam deposition. It is particularly useful in high vacuum processes below 10.sup.-3 Torr, particularly below 10.sup.-4 Torr such as vacuum evaporation and molecular beam deposition, for example vapor phase epitaxy and molecular beam epitaxy.