The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 1987
Filed:
Jun. 20, 1985
Yoshihisa Tawada, Kobe, JP;
Takehisa Nakayama, Kobe, JP;
Masahiko Tai, Otsu, JP;
Nozomu Ikuchi, Nishinomiya, JP;
Kanegafuchi Kagaku Kogyo Kabushiki Kaisha, Osaka, JP;
Shimadzu Corporation, Kyoto, JP;
Abstract
A glow-discharge decomposition apparatus comprises ground electrodes, substrates, RF-electrodes, a RF-power supply, a matching circuit and a controlling circuit having at least one electric element. Each of the substrates is provided on the ground electrodes which are placed over each of the RF-electrodes in parallel to each other. Each of the RF-electrodes standing in parallel are electrically insulated to each other. The matching circuit is connected to accept a RF-power from the RF-power supply. The controlling circuit is connected to accept a RF-power from the matching circuit. The outputs of the controlling circuit are connected to supply RF-powers to the RF-electrodes. The films are fabricated on the substrates by supplying RF-powers being independently controlled via the controlling circuit, thereby plasmas are controlled over each of the RF-electrodes. Thus, deposition rates are individually controlled and uniform films are fabricated on each of the substrates.