The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 1986
Filed:
Sep. 05, 1985
Applicant:
Inventors:
Assignee:
Hitachi, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21B / ; H01J / ;
U.S. Cl.
CPC ...
378119 ; 378 34 ;
Abstract
A plasma X-ray source is operable, like the plasma focus type source, to generate impulse discharge through a gas filled in a discharge tube. A relatively small amount of the gas is continuously supplied to and evacuated from the discharge tube in accordance with an occurrence frequency of discharge, without operating evacuation and filling of the gas at each cycle of discharge, under the regulation to make constant the pressure within the discharge tube, thereby eliminating the time for exchange of gas contaminated by discharge, reducing the amount of gas used, and improving reproducibility of discharge.