The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 18, 1986
Filed:
Jun. 10, 1985
Applicant:
Inventor:
Yukihito Kondo, Tokyo, JP;
Assignee:
Jeol Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
250310 ; 250311 ; 2503 / ;
Abstract
A method for large-angle convergent-beam diffraction comprises selecting a portion of the diffraction pattern formed by an objective lens, by the use of a diaphragm. Then, a portion of the electron micrograph which is formed by the electron beam passed through the diaphragm is detected, thus producing a signal. This enables a large-angle convergent-beam electron diffraction method that permits one to examine a specimen region which is much narrower than conventional.
Kondo, Yukihito. (1986). Method of displaying diffraction pattern by electron microscope (U.S. Patent No. 4623783). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4623783
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile