The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 1986
Filed:
Oct. 26, 1984
Applicant:
Inventors:
Holger K Luthje, Halstenbek, DE;
Angelika M Bruns, Henstedt-Ulzburg, DE;
Margret Harms, Hamburg, DE;
Bernd R Matthiessen, Seevetal, DE;
Assignee:
U.S. Philips Corporation, New York, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
2041 / ; 2041 / ; 430-5 ; 378 35 ; 156645 ;
Abstract
A method of manufacturing a mask for producing patterns in lacquer layers by means of X-ray lithography comprising a diaphragm which is very transparent to the X-ray radiation, is stretched on a frame in a self-supporting manner and which is applied as a thin layer to a substrate in a manner such that it is subjected to tensile stress, while the substrate is then removed as far as a part constituting a frame for the then self-supporting diaphragm.