The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 22, 1986

Filed:

Jul. 14, 1983
Applicant:
Inventor:

Burkhard Lischke, Munich, DE;

Assignee:

Siemens Aktiengesellschaft, Berlin & Munich, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430296 ; 2504923 ; 427 431 ; 430942 ;
Abstract

A mask for corpuscular lithography permits a short exposure time for generating structures on semiconductor wafers, and provides a cost reduction of such structure generation. The mask has a tunnel cathode in corpuscle-emitting regions.


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