The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 1986
Filed:
Jul. 12, 1984
Junji Isohata, Tokyo, JP;
Tamotsu Karasawa, Kawasaki, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An alignment and exposure apparatus including a mask chuck for holding a mask, a wafer chuck for holding a wafer, a projection optical system for projecting the image of the mask onto the wafer, a non-contact distance measuring gauge for measuring the distance from a reference position to the wafer without contacting the wafer, a processing unit for calculating, on the basis of the measured distance, data on the position within the depth of field of the projection optical system and to be assumed by the mask, and an adjusting unit for adjusting the position of the mask in the direction of optical axis in accordance with an output from the processing unit so as to meet the data calculated by the processing unit, whereby the mask pattern is correctly focused on the wafer in the non-contact process with respect to the wafer surface.