The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 1986
Filed:
Sep. 28, 1984
Applicant:
Inventors:
Sukeyoshi Tsunekawa, Tokorozawa, JP;
Yoshio Homma, Tokyo, JP;
Hiroshi Morisaki, Hachioji, JP;
Sadayuki Okudaira, Ome, JP;
Kiichiro Mukai, Hachioji, JP;
Assignee:
Hitachi, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; C03C / ; B05D / ; C23C / ;
U.S. Cl.
CPC ...
156643 ; 118 501 ; 118620 ; 118730 ; 156345 ; 156657 ; 2041 / ; 2041 / ; 204298 ; 427 38 ;
Abstract
In a thin film deposition apparatus, means for depositing a film on a substrate and means for etching the deposited film to make flat the surface thereof, are provided in a reaction vessel independently of each other. This apparatus can rapidly deposit the film without rising the temperature of the substrate excessively. Further, since the deposition means and etching means are independent of each other, the deposition of a film on the substrate and the planarization of the surface of the deposited film can be achieved under various conditions.