The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 1986
Filed:
Jul. 03, 1984
Yutaka Hayashi, Yokohama, JP;
Hisao Izawa, Kawasaki, JP;
Nippon Kogaku K.K., Tokyo, JP;
Abstract
A mask feed method and apparatus for deeding and setting with a high degree of positional accuracy a circuit pattern printing mask in a proximity exposure replicate system for printing integrated circuit patterns on a semiconductor wafer. Arranged on the same stage but separated from a wafer chuck is a mask station on which a mask is set a position different from the exposure position and fed to a mask holder at the exposure position for mask feeding purposes. The mask station is provided with its own displacing means for aligning purposes. Thus, the required movements for mask feeding and alignment purposes are effected by a wafer transfer mechanism.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile