The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 1986
Filed:
Oct. 09, 1984
Applicant:
Inventors:
Josef T Hoog, Novato, CA (US);
James W Mitzel, Richmond, CA (US);
Assignee:
Tegal Corporation, Novato, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K / ;
U.S. Cl.
CPC ...
2191 / ; 2191 / ; 2191 / ; 156345 ;
Abstract
An improved plasma reaction chamber is described in which the interior electrode is readily removed. The interior electrode may comprise a variety of materials, including metallized plastic, thus enabling a disposable electrode and a greater variety of plasmas to be used.
Quick Actions:
Hoog, Josef. (1986). Plasma reactor removable insert (U.S. Patent No. 4585920). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4585920
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile