The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 1986
Filed:
Dec. 03, 1984
Applicant:
Inventors:
Takehisa Nakayama, Kobe, JP;
Kunio Nishimura, Kyoto, JP;
Kazunori Tsuge, Kobe, JP;
Yoshihisa Tawada, Kobe, JP;
Assignee:
Kanegafuchi Kagaku Kogyo Kabushiki Kaisha, Osaka, JP;
Primary Examiner:
Int. Cl.
CPC ...
C25B / ;
U.S. Cl.
CPC ...
2041 / ; 427 38 ; 427 85 ; 427 91 ; 427 95 ;
Abstract
A process for producing a continuous web of an insulated metallic substrate, comprising the steps of depositing an insulation layer on a continuous web of a metallic substrate by plasma CVD method or sputtering method, and depositing a back electrode on the insulation layer by sputtering method or vapor deposition method. According to the present invention, the insulated metallic substrate for a solar cell or printed circuit board can be produced in a continuous manner and in high productivity and quality.