The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 11, 1986

Filed:

Feb. 13, 1985
Applicant:
Inventors:

Paul J Marcoux, Mountain View, CA (US);

Eileen M Murray, Yokohama, JP;

Hugh R Grinolds, Yokohama, JP;

Assignee:

Hewlett-Packard Company, Palo Alto, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; C03C / ; C03C / ; C23F / ;
U.S. Cl.
CPC ...
156643 ; 29591 ; 156646 ; 156652 ; 156656 ; 2041 / ; 427 88 ; 357 65 ;
Abstract

A technique of patterning a conductive layer for interconnections in integrated circuits is disclosed. The technique enables fine line conductors to be fabricated. In accordance with the invention, a pattern for the conductors is etched into the surface of a substrate through the use of a patterned photoresist layer. The conductive layer is then deposited over the photoresist layer and into the pattern etched into the substrate surface. In intervening steps, only the portions of the conductive layer outside the depression of the pattern in the surface are removed; the portions of the conductive layer within the depression remains intact to provide the pattern of fine line conductors desired.


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