The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 1985
Filed:
Jan. 05, 1984
Applicant:
Inventor:
Kenneth H Purser, Manchester, MA (US);
Assignee:
General Ionex Corporation, Newburyport, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61K / ;
U.S. Cl.
CPC ...
31511181 ; 2504923 ; 414222 ; 414225 ;
Abstract
An apparatus is disclosed for the implantation of ions into semiconductor wafers wherein a plurality of storage compartments are connected through valves to a vacuum chamber. A wafer handling device transfers wafers between the storage compartments and a wafer holding device. The wafer holding device positions the wafers in front of an ion beam source. The wafer holding device is a rotatable frustum having a rear end, front end and four trapezoidally shaped sides. Clamps are provided on each side for holding the wafer against the side.