The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 15, 1985

Filed:

Sep. 30, 1982
Applicant:
Inventors:

Kikuo Mita, Yokohama, JP;

Masayuki Oyama, Hino, JP;

Takashi Yoshida, Kawasaki, JP;

Masato Nakashima, Yokohama, JP;

Katsumi Fujihara, Sagamihara, JP;

Tadao Nakakuki, Tokyo, JP;

Assignee:

Fujitsu Limited, Kawasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K / ;
U.S. Cl.
CPC ...
382-8 ; 250563 ; 250572 ; 356237 ; 356384 ; 356387 ; 382 22 ; 382 41 ; 382 68 ;
Abstract

A pattern inspection system for inspecting a pattern formed on a base, such as a photomask, by means of laser beam scanning which includes a device for detecting the body and edges of the pattern, a memory device having a plurality of memory units for separately storing the detected body and plurality of edges of the pattern, a device for measuring the width of the body of the pattern between two parallel edges of the pattern, a device for detecting and correcting missing pattern edges, a device for inverting the pattern, a device for reducing the pattern, and a device for eliminating pinholes and stains within the pattern.


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