The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 1985
Filed:
Jun. 22, 1984
Applicant:
Inventors:
Kazuo Nate, Machida, JP;
Takashi Inoue, Yokohama, JP;
Hitoshi Yokono, Fujisawa, JP;
Mitsuo Ishikawa, Hirakata, JP;
Makoto Kumada, Ibaraki, JP;
Assignee:
Hitachi, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G / ;
U.S. Cl.
CPC ...
528 28 ; 20415913 ; 528 35 ; 430270 ; 430272 ; 430311 ;
Abstract
A photo and radiation sensitive-organopolymeric material having at least one Si--Si).sub.n bond, wherein n is an integer of from 1 to 5 has a good resistance to dry etching, a good adhesion and a good heat resistance and is useful for finer patterning with a good resolution.
Quick Actions:
Nate, Kazuo. (1985). Photo and radiation-sensitive organopolymeric material (U.S. Patent No. 4544729). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4544729
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile