The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 1985
Filed:
May. 07, 1984
Applicant:
Inventors:
Assignee:
Wacker-Chemitronic Gesellschaft fur Elektronik-Grundstoffe m.b.H., Burghausen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ; C03B / ; C03B / ;
U.S. Cl.
CPC ...
427 531 ; 65-312 ; 427163 ; 427237 ; 427166 ;
Abstract
A process for the chemical vapor deposition of oxidic particles by oxidat of halides or halide mixtures wherein dinitrogen monoxide is used as the oxidizing agent. The reaction is carried out at comparatively low temperatures of between 900.degree. and 1150.degree. C., but results in high yields.
Jacob, Herbert. (1985). Process for the chemical vapor deposition of oxidic particles (U.S. Patent No. 4539221). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4539221
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile