The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 1985
Filed:
Apr. 30, 1984
Nicholas Bottka, Burke, VA (US);
Robert W Schwartz, Ridgecrest, CA (US);
Wayne E Thun, Ridgecrest, CA (US);
The United States of America as represented by the Secretary of the Navy, Washington, DC (US);
Abstract
A method of preparing films having the formula A.sup.IIB B.sup.VIA wherein A.sup.IIB is a group IIB metal and B.sup.VIA is a chalcogenide by the photolysis or low temperature thermolysis of an organo-metallic compound containing the targeted A.sup.IIB B.sup.VIA elements is provided. Organo-metallic compounds utilized in the method are of the general formulas R-X-M-X-R', R-M-X-M-R', R-M-X-R', R-M-CH.sub.2 -X-R', R-M-X-X-R' wherein R and R' are hydrogen, an alkyl, an aryl or an organic radical containing a heteroatom, M is a group IIB metal and X is a chalcogenide. Photolysis is carried out with an ultraviolet, visible or infrared light source. The films are useful in the manufacture of semiconductor elements and optical coatings.