The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 1985
Filed:
Apr. 27, 1984
Applicant:
Inventors:
Hisatoshi Furubayashi, Yamatokoriyama, JP;
Junichi Tanaka, Tenri, JP;
Masanori Watanabe, Tenri, JP;
Masaya Hijikigawa, Yamatokoriyama, JP;
Assignee:
Sharp Kabushiki Kaisha, Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; C03C / ; C03C / ; B29C / ;
U.S. Cl.
CPC ...
156643 ; 73 73 ; 156646 ; 156655 ; 1566591 ; 156668 ; 156902 ; 2041 / ; 236 / ;
Abstract
A method for production of a moisture sensor comprising forming a moisture sensitive polymer film on a substrate, disposing a patterned masking material on said moisture sensitive polymer film, and etching said moisture sensitive film by means of an oxygen plasma, whereby a desired fine pattern of the moisture sensitive film is formed with fair accuracy and reproducibility.