The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 1985
Filed:
Oct. 18, 1982
Applicant:
Inventor:
James C Hwang, Berkeley Heights, NJ (US);
Assignee:
AT&T Bell Laboratories, Murray Hill, NJ (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D / ; H01L / ; C23C / ;
U.S. Cl.
CPC ...
156610 ; 156613 ; 156D / ; 118725 ; 427 55 ; 427 86 ;
Abstract
Strain-free mounting and uniform heating of deposition substrates are achieved by coating the backside of the substrate such as a GaAs substrate with a reflective layer. A reflective environment formed, for example, by tantalum foils allows reflections between the reflective surface of the substrate and the reflective surface of the environment. These multiple reflections, in turn, produce uniform heating of the substrate.
Hwang, James. (1985). Method of substrate heating for deposition processes (U.S. Patent No. 4514250). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4514250
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile