The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 02, 1985

Filed:

Nov. 12, 1982
Applicant:
Inventors:

Wai-Hon Lee, Cupertino, CA (US);

Paul H Voisin, San Mateo, CA (US);

Assignee:

Xidex Corporation, , CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430146 ; 430141 ; 430168 ; 430169 ; 430152 ; 430176 ; 430290 ; 430327 ; 430494 ;
Abstract

An improved diazotype photoprinting material of high printing speed and its method of preparation are disclosed. The improvement is achieved by distributing through the film coating a substantially uniform distribution of sites having a refractive index substantially different from that of the remainder of the coating. The sites consist of either voids or finely divided solids. Voids are created by contacting the film coating with an aqueous fluid at elevated temperature or an organic solvent for a sufficient period of time to cause a measurable haze to appear on the film. The sites operate to reflect or refract incident light rays during imagewise exposure, and thus increase the optical path length through a given thickness of film.


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