The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 12, 1985

Filed:

Oct. 06, 1983
Applicant:
Inventors:

Kenneth P Quinlan, Newton, MA (US);

Thomas E Erstfeld, Bedford, MA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
148175 ; 2957 / ; 148174 ; 156612 ; 156613 ; 156614 ; 156D / ;
Abstract

The present invention provides for the deposition of group III-V ternary epitaxial films onto the surfaces of suitable semiconductor substrates. The deposition is accomplished by a vapor phase epitaxy-hydride technique using a group III binary alloy as a group III metal source and phosphine, arsine or stibine as a group V hydride source.


Find Patent Forward Citations

Quinlan, Kenneth. (1985). Process for the epitaxial deposition of iii-v compounds utilizing a (U.S. Patent No. 4504329). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4504329

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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