The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 04, 1984

Filed:

Dec. 07, 1978
Applicant:
Inventors:

William Jeffers, Fair Haven, NJ (US);

Douglas Seeley, High Bridge, NJ (US);

Raimund J Faust, Wiesbaden, DE;

Shuchen Liu, New Providence, NJ (US);

Assignee:

American Hoechst Corporation, Bridgewater, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430300 ; 430175 ; 430177 ; 430179 ; 430145 ; 430294 ; 430302 ; 430945 ;
Abstract

This invention relates to an improvement in a photochemical process for the preparation of printing plates wherein a printing plate comprising a photosensitive composition coated on a support is exposed to a pattern of laser light, the intensity of which is modulated in accordance with an input source of information and said printing plate is subsequently developed by removal from said support of that portion of the photosensitive coating composition which is not exposed to said pattern of laser light, the improvement comprising utilizing a pattern of laser light generated by a laser at a wavelength greater than about 450 nm, and utilizing as a photosensitive composition a negative-working condensate of a para-aminobenzene diazonium compound, said compound being present in a quality of at least 25% of the total coating weight.


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