The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 06, 1984
Filed:
Mar. 15, 1982
Akihiro Takanashi, Kokubunji, JP;
Tatsuo Harada, Fuchu, JP;
Masamoto Akeyama, Kokubunji, JP;
Yataro Kondo, Koganei, JP;
Toshiei Kurosaki, Tokyo, JP;
Shinji Kuniyoshi, Tokyo, JP;
Sumio Hosaka, Hachioji, JP;
Yoshio Kawamura, Tokyo, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
There is disclosed a pattern forming apparatus for projecting a pattern which is formed on a reticle upon a photoresist layer on a substrate which comprises an illumination system for illuminating the pattern for forming an optical image, a reduction lenses for reducing the optical pattern image at a certain reduction ratio and projecting the reduced optical pattern image upon the photoresist layer formed on the substrate for exposing the photoresist layer, and liquid sustaining means for filling a gap between at least a portion of the reduction lenses and the photoresist layer with an optically transparent liquid having a refractive index of more than 1 (one).