The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 1984
Filed:
Oct. 03, 1983
Applicant:
Inventor:
Georges J Gorin, Pinole, CA (US);
Assignee:
Tegal Corp., Novato, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; B44C / ; C03C / ; C23F / ;
U.S. Cl.
CPC ...
156643 ; 156646 ; 156345 ; 2041 / ; 204298 ;
Abstract
An improved plasma reactor apparatus and method are disclosed. Improved uniformity of etching and etch rate are achieved in a reactor through the use of electrodes powered at high and low frequencies. In one embodiment of the invention the workpiece which is to be etched rests on an electrode powered at a low AC frequency of about 100 KHz. A second electrode is powered at a high AC frequency of about 13.56 MHz. A third electrode is maintained at ground potential. High and low frequency AC fields acting on a reactant material optimize the dissociation of the reactant material and the ion energy of the plasma generated reactant species.