The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 03, 1984

Filed:

Jul. 09, 1982
Applicant:
Inventors:

Ari Aviram, Yorktown Heights, NY (US);

Veronica I Mayne-Banton, Ossining, NY (US);

Rangaswamy Srinivasan, Ossining, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
427 541 ; 427 98 ; 427306 ;
Abstract

A method for selective electroless deposition of a metal (Cu, Ni, Au, Ag) onto a polyester substrate, such as poly(ethylene terephthalate) is described. A combination of ultraviolet exposure of wavelengths <220 nm and a pre-treatment step is used to obtain selective electroless deposition. The polyester layer is first irradiated with uv light of wavelengths <220 nm and is then subjected to a pre-plating pre-treatment with a basic solution. After this, the desired metal is deposited by conventional electroless deposition. Substantial deposition will occur only in those areas which were both exposed to the uv light and subjected to the pre-plating treatment.


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