The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 1984
Filed:
Mar. 15, 1982
Applicant:
Inventors:
George J Cernigliaro, Framingham, MA (US);
Charles R Shipley, Newton, MA (US);
Assignee:
Shipley Company Inc., Newton, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; G03C / ; B05D / ;
U.S. Cl.
CPC ...
430323 ; 430192 ; 430193 ; 430166 ; 430309 ; 430310 ; 430311 ; 430315 ; 430318 ; 430330 ; 430326 ;
Abstract
This invention is for a photoresist capable of withstanding temperatures in excess of 200.degree. C. without image distortion. The photoresist comprises a high temperature diazo sensitizer, preferably an ester or amide of an o-quinone diazide sulfonic or carboxylic acid chloride, in a binder comprising a polyvinyl phenol. The sensitizer and polyvinyl phenol react with each other at elevated temperature. The sensitizer has a secondary decomposition temperature and the polyvinyl phenol has a flow temperature at least equal to the temperature where reaction between the two occurs.