The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 28, 1984

Filed:

Jun. 11, 1982
Applicant:
Inventors:

Shuji Tsuchiya, Funabashi, JP;

Hisao Ikeda, Funabashi, JP;

Kenji Suzuki, Funabashi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C / ;
U.S. Cl.
CPC ...
2604 / ;
Abstract

Disclosed is an improved process for preparing di-lower alkyl naphthalenedisulfonyl by employing a naphthalenedisulfonate chloride and a stoichiometrically excess amount of an aliphatic alcohol and allowing them to react in the presence of an aqueous solution of an alkali. The improved process comprises treating the reaction product from said process with an alkali metal alcoholate and then washing the thus treated reaction product with water to obtain a highly pure product. Also disclosed is a process of limiting the formation of undesirable impurities arising from the reaction of said naphthalenedisulfonyl chloride and said aliphatic alcohol.


Find Patent Forward Citations

Tsuchiya, Shuji. (1984). Preparation of high purity di-lower alkyl naphthalenedisulfonates (U.S. Patent No. 4434104). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4434104

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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