The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 1984
Filed:
Aug. 08, 1983
George Maheras, Fort Collins, CO (US);
Hubert O Hayworth, Loveland, CO (US);
NCR Corporation, Dayton, OH (US);
Abstract
A process for beveling the sharp corners on an integrated circuit metal layer, which corners were created by commonly practiced masking and etching steps. In one form, the photoresist mask used to etch the lower level metal pattern is retained on the wafer as during the beveling operation. With a positive photoresist and an aluminum alloy metal lower level layer, an etch with an alkaline photoresist solvent will isotropically remove both photoresist and metal, but at a controlled difference in rate. Beveling of the metal corners suppresses the reentry effect otherwise encountered when subsequent dielectric materials are deposited over the lower level metal layer.