The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 1983
Filed:
Nov. 04, 1982
Applicant:
Inventors:
Assignee:
Anelva Corporation, Fuchu, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
204298 ; 2041 / ; 2041 / ;
Abstract
In a sputtering apparatus of the type wherein a cathode including a target made of ferromagnetic material and a substrate to be sputtered are disposed in an evacuated vessel in a spaced opposing relationship so as to sputter the target with ions to form thin magnetic films on said substrate, there are provided a magnet disposed on a backing plate, a shield covering surfaces of the magnet facing the substrate, the shield being made of the same or similar material as the target, and a metal block disposed to surround the magnet in contact with the shield and the backing plate. A passage for passing cooling water to cool the above components is further provided in the cathode.