The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 14, 1983

Filed:

Nov. 20, 1978
Applicant:
Inventor:

Saurabh D Emmanuel, Stamford, CT (US);

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B / ;
U.S. Cl.
CPC ...
378 34 ; 378 / ; 378143 ; 430967 ;
Abstract

A soft X-ray lithography system including an X-ray tube having an evacuated and sealed-off envelope provided with an X-ray transparent window made of beryllium material and enclosing a rotatable anode target made of graphite material, the target having an annular sloped surface carrying a focal track layer made of titanium carbide material and having a focal spot area aligned with an electron emitting cathode to generate characteristic titanium K alpha X-rays which pass in a beam through the window, a mask aligned with the window and having transparent portions which transmit the beamed X-rays, and a workpiece, such as a semiconductor wafer, for example, having a surface coated with a photoresist film disposed in alignment with the mask to have selected portions of the film irradiated by the X-rays transmitted through the transparent portions of the mask.


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