The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 25, 1983

Filed:

Jun. 10, 1981
Applicant:
Inventor:

Hidefumi Funaki, Fuchu, JP;

Assignee:

Anelva Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
204298 ;
Abstract

For use in a magnetron-type sputtering device, a target assembly comprises a magnetic target plate and first and second permanent magnet pieces brought into contact with the target plate circumferentially and centrally of the target plate with differently named poles of the respective magnet pieces placed nearer to the target plate. The magnet pieces may be attached to that surface of the target plate which is directed to a hollow space of the sputtering device. Alternatively, the magnet pieces may be attached to inner and outer circumferential surfaces of the target plate, respectively. Preferably, the magnet pieces are covered with a shield cover of a conductor or the material of the target plate. A conductive body is placed in contact with the target plate on the side opposite to the above-mentioned surface to serve as an electrode. The conductive body is preferably made of a soft magnetic material.


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