The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 14, 1982
Filed:
Jun. 22, 1981
Sheng T Hsu, Lawrenceville, NJ (US);
George L Schnable, Lansdale, PA (US);
RCA Corporation, New York, NY (US);
Abstract
A process for defining improved tapered contact openings in glass coatings comprising the deposition of a layer of low temperature flowable passivating glass and the deposition of a masking layer to initially approximately define contact areas over portions of the active regions and over portions of a gate line. The first contact openings are then etched and the passivating layer caused to reflow followed by a second etch, in the previously etched areas, which second etch accurately defines the contact openings. The final etch rounds off any corners produced by the second etch to produce smoothly tapered contact openings. .circle.