The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 10, 1982

Filed:

Mar. 23, 1981
Applicant:
Inventors:

Eliezer Kinsbron, Highland Park, NJ (US);

Hyman J Levinstein, Berkeley Heights, NJ (US);

William E Willenbrock, Jr, Manchester Township, Ocean County, NJ (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; H01L / ; C03C / ; C23F / ;
U.S. Cl.
CPC ...
156643 ; 156644 ; 156646 ; 156652 ; 1566591 ; 156668 ; 2041 / ; 427 431 ;
Abstract

In the patterning of an organic layer on a VLSI wafer by means of reactive oxygen (or other) ion anisotropic etching, build-ups of oxides (or other compounds) on the sidewalls of apertures formed in the organic layer are removed prior to etching the material, typically aluminum, of the VLSI wafer located at the bottom of these apertures, using the patterned organic layer as an etch mask.


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