The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 1982
Filed:
Mar. 19, 1981
Applicant:
Inventor:
Walter F Reichert, E. Brunswick, NJ (US);
Assignee:
RCA Corporation, New York, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
427 86 ; 427 87 ; 427 88 ; 156612 ; 156656 ; 430318 ;
Abstract
A monocrystalline semiconductor substrate is provided, and a thin film pattern is defined on a surface thereof. An epitaxial layer is then grown on the substrate surface such that it overgrows the thin film pattern a predetermined distance. That portion of the thin film not covered by the epitaxial layer is then removed.
Reichert, Walter. (1982). Method for forming a narrow thin film line (U.S. Patent No. 4324814). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4324814
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile