The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 1982
Filed:
Dec. 06, 1979
Noritaka Mochizuki, Yokohama, JP;
Setsuo Minami, Kawasaki, JP;
Yoshiya Matsui, Yokohama, JP;
Koyo Midorikawa, Tokyo, JP;
Atsuo Tsunoda, Fuchu, JP;
Hidetoshi Murase, Yokohama, JP;
Mikio Suzuta, Yokohama, JP;
Masazumi Moriwaki, Tokyo, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
In a slit exposure type copying machine, a projection device basically includes transmission type element lens systems each including a lens having a great length in the direction of the optic axis thereof as compared with the effective diameter thereof. A part area of an original is projected upon a predetermined part area on an image plane and the light intensity distribution of the projected part area has a predetermined central area controlled by lens aperture eclipse and extending diametrically from at least the optic axis and a marginal area lying outwardly of the central area and weak in light intensity. A plurality of such element lens systems are substantially equidistantly arranged in the lengthwise direction of the slit in a plane perpendicular to the optic axis so that the marginal areas in at least the element lens systems are superposed upon one another. Further, the element lens systems are arranged in a plurality of rows so that each row is positioned just intermediate the adjacent row, whereby even if there is an error in the arrangement interval of the element lens systems, the uniformity, in the slit area, of the exposure amount time-integrated in the original scanning direction is maintained.