The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 1982
Filed:
Dec. 21, 1979
Satoshi Shinozaki, Yokohama, JP;
Shinzi Saito, Yokohama, JP;
Abstract
Disclosed is a method for manufacturing an integrated circuit device which comprises the steps of preparing a silicon substrate having an isolated first region of a first conductivity type, selectively forming on the first region a polycrystalline silicon layer containing an impurity of the first conductivity type, implanting the first region including the polycrystalline silicon layer with an ion of an impurity of a second conductivity type having higher diffusion coefficient than that of the impurity of the first conductivity type, and heating the substrate, whereby the implanted impurity of the second conductivity type is diffused into the first region to form a second region of the second conductivity type and the impurity of the first conductivity type in the polycrystalline silicon layer is diffused into the second region to form a third region of the first conductivity type.