The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 1981
Filed:
Dec. 29, 1978
John Balyoz, Hopewell Junction, NY (US);
Chi S Chang, Wappingers Falls, NY (US);
Barry C Fox, Poughkeepsie, NY (US);
John A Palmieri, Wappingers Falls, NY (US);
Majid Ghafghaichi, Poughkeepsie, NY (US);
Teh-Sen Jen, Fishkill, NY (US);
Donald B Mooney, Poughkeepsie, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Disclosed are improved LSI semiconductor design structures termed 'Master Image Chip Organization Techniques'. Utilizing the technique provides increased density and optimized performance of semiconductor devices, circuits, and part number functions. In accordance with the disclosed Master Image Chip Organization Method the semiconductor chips are optimally structured to facilitate the maximum number of devices and circuits, and to facilitate fabrication of a wide variety of LSI part numbers. Essentially, none of the semiconductor surface is dedicated for signal and power wiring channels. A master image wiring structure is provided which resides over the semiconductor surface and beneath a power surface. In addition, the master image wiring structure provides a means for personalizing power and signal wiring for a multiple power surface structure. The combined master image structure provides a means for optimally allocating semiconductor area for devices, functional units (micro and macro) and signal and power wiring to facilitate improved density and performance.