The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 1981
Filed:
May. 04, 1979
Adam Heller, Bridgewater, NJ (US);
King L Tai, Berkeley Heights, NJ (US);
Richard G Vadimsky, Somerville, NJ (US);
Bell Telephone Laboratories, Incorporated, Murray Hill, NJ (US);
Abstract
Lithographic patterning of particular interest in fabrication of integrated circuitry is based on the photoinduced migration of silver into germanium selenide or other glassy material of appropriate absorption cross section for the chosen actinic radiation. Resists which are negative-acting yield high resolution attributed to initial introduction of the silver in chemically combined form chosen so as to result in formation of a silver compound with a glass component with the compound serving as silver source. Removal of excess silver-containing material is engineered on the basis of the form of silver introduction and results in conversion to a water soluble form. Commercial use will likely be based on an embodiment in which the now developed patterned resist serves as a dry etching mask during delineation of a relatively thick underlying layer of organic material. This procedure is particularly advantageous for use on partially processed circuitry in which prior operations have resulted in surface steps.