The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 1981
Filed:
Apr. 20, 1979
Applicant:
Inventor:
Richard D Pashley, Sunnyvale, CA (US);
Assignee:
Intel Corporation, Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
29571 ; 2957 / ; 29578 ; 29579 ; 148-15 ; 148187 ; 357 42 ;
Abstract
An MOS process for fabricating multi-layer integrated circuits particularly suited for SOS fabrication is disclosed. Transistors are fabricated both on the substrate level and in an overlying polysilicon layer. Processing techniques for aligning source and drain regions with a buried gate are described. In one embodiment, a photoresist layer is exposed to light directed through the sapphire substrate, thereby employing the buried gate as a masking member. Laser annealing may be used to provide larger crystals of silicon in the polysilicon layer.