The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 1981
Filed:
Nov. 22, 1978
Heiner Herbst, Haar, DE;
Hans-Jorg Pfleiderer, Zorneding, DE;
Rudolf Koch, Germering-Unterpfaffenhofen, DE;
Jeno Tihanyi, Munich, DE;
Siemens Aktiengesellschaft, Berlin & Munich, DE;
Abstract
The invention relates to an optoelectronic sensor with at least one sensor element according to the principle of carrier injection (CID), whereby the surface of a doped semiconductor body is faced by two closely adjoining electrodes insulated from one another and from the semiconductor surface by a thin insulation layer that are controllable via separate control circuits. The semiconductor body contains a more strongly doped area having the type of the semiconductor doping on its surface below one of the electrodes, which area extends slightly into the semiconductor surface lying below the other electrode. Thereby, a narrow potential barrier is formed between the two electrodes, for example, between a line electrode and a column electrode. When an optically generated charge under one electrode is displaced under the other electrode, then this narrow potential barrier prevents a flow back of the charge under the discharged electrode. This makes a floating readout possible, in which the couplings-in of the line circuits onto the column circuits can be eliminated. The more strongly doped area above referred to preferably tapers wedge-shaped under the other electrode and is produced by means of implantation, whereby the field oxide and the electrode, whose edges are beveled, are used as the implantation mask.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile