The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 1980
Filed:
Oct. 06, 1978
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A printing apparatus for use in the manufacture of semiconductor circuit elements, comprising a fixed mirror imaging system. A mask holder and wafer holder are respectively provided in an upper horizontal plane and a lower horizontal plane on the optical axis above and below said mirror imaging system, the light emerging from the mask being introduced into said system by a mirror inclined at 45.degree. to the optical axis while the light emerging from said system is directed to the wafer by an another mirror inclined at 45.degree. to the optical axis. The mask holder and wafer holder are integrally movable in the horizontal direction to allow formation of the entire image of mask on the wafer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile