The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 1980
Filed:
Jan. 03, 1979
Applicant:
Inventors:
Yoshio Hom-ma, Hachioji, JP;
Hisao Nozawa, Hinodemachi, JP;
Akira Sato, Hachioji, JP;
Seiki Harada, Hachioji, JP;
Assignee:
Hitachi, Ltd., , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25F / ; C25F / ; C23C / ;
U.S. Cl.
CPC ...
20412965 ; 2041 / ;
Abstract
A lift-off layer made of a non-photosensitive resin or the like deposited on a substrate is put into a pattern inverse to an interconnection pattern by etching employing a molybdenum mask, a metal layer for interconnection metalization is formed on the whole area of the lift-off layer, and the molybdenum mask is removed by electrolytic etching, to simultaneously strip off and remove the metal layer overlying the mask, whereby an interconnection is formed. Thus, the interconnection can be formed in a much shorter time than in a prior-art lift-off technique.