The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 06, 1979

Filed:

Aug. 22, 1977
Applicant:
Inventor:

Stephen A Farnow, Dallas, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B01J / ;
U.S. Cl.
CPC ...
29578 ; 29571 ; 357 24 ; 357 91 ;
Abstract

Excess signal charge generated in response to optical overload of a charge-coupled sensing region is removed from that region by an antiblooming drain implanted in the substrate of the sensing array. The antiblooming drain is separated from the row of sensing regions by a potential barrier produced by a gate electrode associated with the drain. In fabricating the charge-coupled optical imager, the antiblooming drain is self-aligned with the antiblooming gate electrodes by first providing a pair of spaced-apart antiblooming gate electrodes and implanting the drain region into the substrate using the gate electrodes as a mask.


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Farnow, Stephen. (1979). Split gate electrode, self-aligned antiblooming structure and method of (U.S. Patent No. 4173064). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4173064

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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